physical vapor deposition

To define the atom cloud which is the atom's probability in crystal, it can explain the reason of residual stress in film prepared by physical vapor deposition. The theory model on residual stress mechanism in film was established.

将晶体中原子的概率分布定义为原子云，解释了物理气相沉积法制备薄膜时残余应力产生的原因，建立了薄膜残余应力产生机理的理论模型。

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The deposition methods include mainly physical vapor deposition and thermal spraying techniques.

准晶薄膜的制备方法主要有物理汽相沉积法和热喷涂法两大类。

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The Effecting Factors of Adhesion on Physical Vapor Deposition Thin Films

物理气相沉积薄膜附着性的影响因素

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